Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
Type:
Journal
Info:
Applied Surface Science 459 (2018) 596-605
Date:
2018-07-29
Author Information
Name | Institution |
---|---|
Seungmin Yeo | Yonsei University |
Dip K. Nandi | Yeungnam University |
R. Rahul | Yeungnam University |
Tae Hyun Kim | Yeungnam University |
Bonggeun Shong | Hongik University |
Yujin Jang | Korean Basic Science Institute |
Jong-Seong Bae | Korean Basic Science Institute |
Jeong Woo Han | Pohang University of Science and Technology (POSTECH) |
Soo-Hyun Kim | Yeungnam University |
Hyungjun Kim | Yonsei University |
Films
Plasma WS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Electrochemical Performance
Analysis: Electrochemical Analysis
Characteristic: Battery Properties
Analysis: Electrochemical Analysis
Characteristic: Precursor Characterization
Analysis: -
Substrates
SiO2 |
Stainless Steel |
Ni |
Notes
Supporting information has useful W(CO)6 thermal stability data. |
1585 |