Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
Type:
Journal
Info:
Applied Surface Science 459 (2018) 596-605
Date:
2018-07-29
Author Information
| Name | Institution |
|---|---|
| Seungmin Yeo | Yonsei University |
| Dip K. Nandi | Yeungnam University |
| R. Rahul | Yeungnam University |
| Tae Hyun Kim | Yeungnam University |
| Bonggeun Shong | Hongik University |
| Yujin Jang | Korean Basic Science Institute |
| Jong-Seong Bae | Korean Basic Science Institute |
| Jeong Woo Han | Pohang University of Science and Technology (POSTECH) |
| Soo-Hyun Kim | Yeungnam University |
| Hyungjun Kim | Yonsei University |
Films
Plasma WS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Electrochemical Performance
Analysis: Electrochemical Analysis
Characteristic: Battery Properties
Analysis: Electrochemical Analysis
Characteristic: Precursor Characterization
Analysis: -
Substrates
| SiO2 |
| Stainless Steel |
| Ni |
Notes
| Supporting information has useful W(CO)6 thermal stability data. |
| 1585 |