Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications

Type:
Journal
Info:
Applied Surface Science 459 (2018) 596-605
Date:
2018-07-29

Author Information

Name Institution
Seungmin YeoYonsei University
Dip K. NandiYeungnam University
R. RahulYeungnam University
Tae Hyun KimYeungnam University
Bonggeun ShongHongik University
Yujin JangKorean Basic Science Institute
Jong-Seong BaeKorean Basic Science Institute
Jeong Woo HanPohang University of Science and Technology (POSTECH)
Soo-Hyun KimYeungnam University
Hyungjun KimYonsei University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Electrochemical Performance
Analysis: Electrochemical Analysis

Characteristic: Battery Properties
Analysis: Electrochemical Analysis

Characteristic: Precursor Characterization
Analysis: -

Substrates

SiO2
Stainless Steel
Ni

Notes

Supporting information has useful W(CO)6 thermal stability data.
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