Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
Info:
Applied Surface Science 459 (2018) 596-605
Author Information
Films
Film/Plasma Properties
Analysis: AFM, Atomic Force Microscopy
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: TEM, Transmission Electron Microscope
Analysis: TEM, Transmission Electron Microscope
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: Electrochemical Analysis
Analysis: Electrochemical Analysis
Substrates
Notes
| Supporting information has useful W(CO)6 thermal stability data. |
| 1585 |