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Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Thin Solid Films 518 (2010) 4757 - 4761
Date:
2010-01-12
DOI:
http://dx.doi.org/10.1016/j.tsf.2010.01.015

Author Information

Name Institution
Changsoo LeePohang University of Science and Technology (POSTECH)
Jungwon KimPohang University of Science and Technology (POSTECH)
Gil-Ho GuPohang University of Science and Technology (POSTECH)
Du-Hwan JoPOSCO
Chan Gyung ParkPohang University of Science and Technology (POSTECH)
Wonyong ChoiPohang University of Science and Technology (POSTECH)
Hyungjun KimYonsei University

Films

Plasma TiO2

Hardware used: Custom Remote Inductively Coupled Plasma
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam VASE

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2100F

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku D/Max-1400

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 220iXL

Characteristic: Photocatalytic Activity
Analysis: Contact Angle Measurement
Diagnostic: -

Characteristic: Photocatalytic Activity
Analysis: Organic Compound Decomposition
Diagnostic: -

Substrates

Zn

Notes

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