Publication Information

Title:
Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 518 (2010) 4757 - 4761
Date:
2010-01-12

Author Information

Name Institution
Changsoo LeePohang University of Science and Technology (POSTECH)
Jungwon KimPohang University of Science and Technology (POSTECH)
Gil-Ho GuPohang University of Science and Technology (POSTECH)
Du-Hwan JoPOSCO
Chan Gyung ParkPohang University of Science and Technology (POSTECH)
Wonyong ChoiPohang University of Science and Technology (POSTECH)
Hyungjun KimYonsei University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Photocatalytic Activity
Analysis: Contact Angle Measurement

Characteristic: Photocatalytic Activity
Analysis: Organic Compound Decomposition

Substrates

Zn

Keywords

Photocatalyst

Notes

728