Publication Information

Title:
Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
Type:
Journal
Info:
J. Vac. Sci. Technol. B, Vol. 24, No. 5, Sep/Oct 2006
Date:
2006-08-01

Author Information

Name Institution
Wan Joo MaengPohang University of Science and Technology (POSTECH)
Sang-Joon ParkPohang University of Science and Technology (POSTECH)
Hyungjun KimPohang University of Science and Technology (POSTECH)

Films

Plasma Ta2O5


Thermal Ta2O5




Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(100)

Keywords

Notes

1164