Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Sang-Joon Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sang-Joon Park returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
2Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
3Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
4Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode