Publication Information

Title: Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition

Type: Journal

Info: Applied Surface Science 365 (2016) 160 - 165

Date: 2016-01-07

DOI: http://dx.doi.org/10.1016/j.apsusc.2016.01.038

Author Information

Name

Institution

Yeungnam University

Yonsei University

Incheon National University

Yonsei University

Yeungnam University

Films

Plasma MoS2 using Unknown

Deposition Temperature Range = 175-225C

13939-06-5

7783-06-4

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

SiO2

Keywords

High Aspect Ratio

Notes

617



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