Publication Information

Title:
Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
Type:
Journal
Info:
Applied Surface Science 365 (2016) 160 - 165
Date:
2016-01-07

Author Information

Name Institution
Yujin JangYeungnam University
Seungmin YeoYonsei University
Han-Bo-Ram LeeIncheon National University
Hyungjun KimYonsei University
Soo-Hyun KimYeungnam University

Films

Plasma MoS2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

SiO2

Keywords

High Aspect Ratio

Notes

617