Publication Information

Title:
Formation of Ni silicide from atomic layer deposited Ni
Type:
Journal
Info:
Current Applied Physics Volume 16, Issue 7, 2016, Pages 720 - 725
Date:
2016-04-04

Author Information

Name Institution
Jaehong YoonYonsei University
Soo Hyeon KimYonsei University
Hangil KimYeungnam University
Soo-Hyun KimYeungnam University
Hyungjun KimYonsei University
Han-Bo-Ram LeeIncheon National University

Films

Plasma Ni


Thermal Ni


Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

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