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Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (5) D188-D192 (2009)
Date:
2009-02-09
Author Information
| Name | Institution |
|---|---|
| Changsoo Lee | Pohang University of Science and Technology (POSTECH) |
| Jungwon Kim | Pohang University of Science and Technology (POSTECH) |
| J. Y. Son | Pohang University of Science and Technology (POSTECH) |
| Wan Joo Maeng | Pohang University of Science and Technology (POSTECH) |
| Du-Hwan Jo | POSCO |
| Wonyong Choi | Pohang University of Science and Technology (POSTECH) |
| Hyungjun Kim | Pohang University of Science and Technology (POSTECH) |
Films
Film/Plasma Properties
Characteristic: Self Cleaning
Analysis: Contact Angle Measurement
Characteristic: Self Cleaning
Analysis: Organic Compound Decomposition
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| SUS 304 Stainless Steel |
| Si(001) |
Notes
| 751 |