Publication Information

Title: Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application

Type: Journal

Info: Journal of The Electrochemical Society, 156 (5) D188-D192 (2009)

Date: 2009-02-09

DOI: http://dx.doi.org/10.1149/1.3095515

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

POSCO

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Films

Plasma TiO2 using Custom

Deposition Temperature Range = 150-400C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Self Cleaning

Contact Angle Measurement

-

Self Cleaning

Organic Compound Decomposition

-

Thickness

Ellipsometry

-

Thickness

SEM, Scanning Electron Microscopy

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Substrates

SUS 304 Stainless Steel

Si(001)

Keywords

Self Cleaning

Notes

751



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