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Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
Type:
Journal
Info:
Applied Surface Science 568 (2021) 150939
Date:
2021-08-10
Author Information
| Name | Institution |
|---|---|
| Yujin Lee | Yonsei University |
| Seunggi Seo | Yonsei University |
| Taewook Nam | Yonsei University |
| Hyunho Lee | Yonsei University |
| Hwi Yoon | Yonsei University |
| Sangkyu Sun | Yonsei University |
| Il-Kwon Oh | Yonsei University |
| Sanghun Lee | Yonsei University |
| Bonggeun Shong | Hongik University |
| Jin Hyung Seo | Hansol Chemical |
| Jang Hyeon Seok | Hansol Chemical |
| Hyungjun Kim | Yonsei University |
Films
Plasma W
Plasma W
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Substrates
| SiO2 |
Notes
| 1707 |