Name

Institution

Wan Joo Maeng

Pohang University of Science and Technology (POSTECH)

Gil-Ho Gu

Pohang University of Science and Technology (POSTECH)

Chan Gyung Park

Pohang University of Science and Technology (POSTECH)

Kayoung Lee

Yonsei University

Taeyoon Lee

Yonsei University

Hyungjun Kim

Pohang University of Science and Technology (POSTECH)

Plasma HfN_x using Quros Plus 200

Deposition Temperature Range N/A

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

H₂, Hydrogen

1333-74-0

Plasma HfO₂ using Quros Plus 200

Deposition Temperature Range N/A

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

O₂, Oxygen

7782-44-7

Plasma HfON using Quros Plus 200

Deposition Temperature Range N/A

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

O₂, Oxygen

7782-44-7

H₂, Hydrogen

1333-74-0

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy

-

Bonding States

ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Synchrotron

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Synchrotron

Conduction Band Edge States

NEXAFS, Near-Edge X-ray Absorption Fine Structures

Synchrotron

Microstructure

TEM, Transmission Electron Microscope

JEOL 2100F

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL 2100F

Hysteresis

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

Interface Trap Density

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

NBTI, Negative Bias Temperature Instability

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

Trapped Positive Charge-Density Change

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

CET, capacitance equivalent thickness

C-V, Capacitance-Voltage Measurements

Keithley 4200-SCS

Leakage Current

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Si(001)

743