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Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
Type:
Journal
Info:
Surface & Coatings Technology 344 (2018) 12-20
Date:
2018-02-21
Author Information
| Name | Institution |
|---|---|
| Taejin Choi | Yonsei University |
| Seungmin Yeo | Yonsei University |
| Jeong-Gyu Song | Yonsei University |
| Seunggi Seo | Yonsei University |
| Byeonghyeon Jang | Yeungnam University |
| Soo-Hyun Kim | Yeungnam University |
| Hyungjun Kim | Yonsei University |
Films
Plasma C
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Bonding States
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Mobility
Analysis: Four-point Probe
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
| SiO2 |
Notes
| 1682 |