Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films

Type:
Journal
Info:
Surface & Coatings Technology 344 (2018) 12-20
Date:
2018-02-21

Author Information

Name Institution
Taejin ChoiYonsei University
Seungmin YeoYonsei University
Jeong-Gyu SongYonsei University
Seunggi SeoYonsei University
Byeonghyeon JangYeungnam University
Soo-Hyun KimYeungnam University
Hyungjun KimYonsei University

Films

Plasma C


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Bonding States
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Mobility
Analysis: Four-point Probe

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization

Substrates

SiO2

Keywords

Substrate Plasma Pretreatment

Notes

1682