The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
Type:
Journal
Info:
Thin Solid Films 441 (2003) 311 - 316
Date:
2003-05-30
Author Information
| Name | Institution |
|---|---|
| Hyungjun Kim | IBM |
| S. M. Rossnagel | IBM |
Films
Plasma Ta
Film/Plasma Properties
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: FRES, Forward Recoil Elastic Spectrometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction
Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(001) |
| SiO2 |
Notes
| 1233 |