The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 13 (5) H151-H154 (2010)
Date:
2010-03-04
Author Information
Name | Institution |
---|---|
S. J. Lim | Pohang University of Science and Technology (POSTECH) |
Jae-Min Kim | Yonsei University |
Doyoung Kim | Yonsei University |
Changsoo Lee | Pohang University of Science and Technology (POSTECH) |
Jin-Seong Park | Dankook University |
Hyungjun Kim | Yonsei University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Characteristic: Transfer Curves
Analysis: I-V, Current-Voltage Measurements
Characteristic: Off Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: On/Off Current Ratio
Analysis: I-V, Current-Voltage Measurements
Characteristic: Subthreshold Swing
Analysis: I-V, Current-Voltage Measurements
Characteristic: Mobility
Analysis: I-V, Current-Voltage Measurements
Characteristic: Threshold Voltage
Analysis: I-V, Current-Voltage Measurements
Substrates
Al2O3 |
Glass |
Corning 1737 |
Notes
ZnO etched with dilute HCl |
48 |