Title: The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
Type: Journal
Info: Electrochemical and Solid-State Letters, 13 (5) H151-H154 (2010)
Date: 2010-03-04
DOI: http://dx.doi.org/10.1149/1.3322733
Name
Institution
Pohang University of Science and Technology (POSTECH)
Yonsei University
Yonsei University
Pohang University of Science and Technology (POSTECH)
Dankook University
Yonsei University
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
Rudolf AutoEL II
Chemical Binding
XPS, X-ray Photoelectron Spectroscopy
Unknown
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Unknown
Resistivity, Sheet Resistance
Hall Measurements
Unknown
Transfer Curves
I-V, Current-Voltage Measurements
Keithley 4200-SCS
Off Current
I-V, Current-Voltage Measurements
Keithley 4200-SCS
On/Off Current Ratio
I-V, Current-Voltage Measurements
Keithley 4200-SCS
Subthreshold Swing
I-V, Current-Voltage Measurements
Keithley 4200-SCS
Mobility
I-V, Current-Voltage Measurements
Keithley 4200-SCS
Threshold Voltage
I-V, Current-Voltage Measurements
Keithley 4200-SCS
Al2O3
Glass
Corning 1737
TCO, Transparent Conducting Oxide
TFT, Thin Film Transistor
ZnO etched with dilute HCl
48
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