The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

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Publication Information

Title: The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

Type: Journal

Info: Electrochemical and Solid-State Letters, 13 (5) H151-H154 (2010)

Date: 2010-03-04

DOI: http://dx.doi.org/10.1149/1.3322733

Author Information

Name

Institution

S. J. Lim

Pohang University of Science and Technology (POSTECH)

Jae-Min Kim

Yonsei University

Doyoung Kim

Yonsei University

Changsoo Lee

Pohang University of Science and Technology (POSTECH)

Jin-Seong Park

Dankook University

Hyungjun Kim

Yonsei University

Films

Plasma ZnO using Custom

Deposition Temperature = 200C

DEZ, DiEthyl Zinc, ZnEt₂, Zn(C₂H₅)₂

557-20-0

Where to buy precursor

Oxygen, O₂

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Rudolf AutoEL II

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Resistivity, Sheet Resistance

Hall Measurements

Unknown

Transfer Curves