The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

Type:
Journal
Info:
Electrochemical and Solid-State Letters, 13 (5) H151-H154 (2010)
Date:
2010-03-04

Author Information

Name Institution
S. J. LimPohang University of Science and Technology (POSTECH)
Jae-Min KimYonsei University
Doyoung KimYonsei University
Changsoo LeePohang University of Science and Technology (POSTECH)
Jin-Seong ParkDankook University
Hyungjun KimYonsei University

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements

Characteristic: Transfer Curves
Analysis: I-V, Current-Voltage Measurements

Characteristic: Off Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: On/Off Current Ratio
Analysis: I-V, Current-Voltage Measurements

Characteristic: Subthreshold Swing
Analysis: I-V, Current-Voltage Measurements

Characteristic: Mobility
Analysis: I-V, Current-Voltage Measurements

Characteristic: Threshold Voltage
Analysis: I-V, Current-Voltage Measurements

Substrates

Al2O3
Glass
Corning 1737

Keywords

TCO, Transparent Conducting Oxide
TFT, Thin Film Transistor

Notes

ZnO etched with dilute HCl
48