Publication Information

Title: The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

Type: Journal

Info: Electrochemical and Solid-State Letters, 13 (5) H151-H154 (2010)

Date: 2010-03-04

DOI: http://dx.doi.org/10.1149/1.3322733

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Yonsei University

Yonsei University

Pohang University of Science and Technology (POSTECH)

Dankook University

Yonsei University

Films

Plasma ZnO using Custom

Deposition Temperature = 200C

557-20-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Rudolf AutoEL II

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Resistivity, Sheet Resistance

Hall Measurements

-

Transfer Curves

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Off Current

I-V, Current-Voltage Measurements

Keithley 4200-SCS

On/Off Current Ratio

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Subthreshold Swing

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Mobility

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Threshold Voltage

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Substrates

Al2O3

Glass

Corning 1737

Keywords

TCO, Transparent Conducting Oxide

TFT, Thin Film Transistor

Notes

ZnO etched with dilute HCl

48



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