Jin-Seong Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jin-Seong Park returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
3Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
4Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
5Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
6Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
7Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
8Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
10Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
11Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
12Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
13Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
14Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
15Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
16Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
17Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
18Surface and sensing properties of PE-ALD SnO2 thin film
19The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor