Publication Information

Title:
Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 31, 01A124 (2013)
Date:
2012-11-02

Author Information

Name Institution
Tae-Hoon JungDankook University
Jin-Seong ParkDankook University
Dong-Ho KimKorea Institute of Materials Science
Yongsoo JeongKorea Institute of Materials Science
Sung-Gyu ParkKorea Institute of Materials Science
Jung-Dae KwonKorea Institute of Materials Science

Films

Other ZnO


Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance

Characteristic: Mobility
Analysis: van der Pauw sheet resistance

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Silicon
Glass

Keywords

Notes

642