Publication Information

Title: Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 31, 01A124 (2013)

Date: 2012-11-02

DOI: http://dx.doi.org/10.1116/1.4767813

Author Information

Name

Institution

Dankook University

Dankook University

Korea Institute of Materials Science

Korea Institute of Materials Science

Korea Institute of Materials Science

Korea Institute of Materials Science

Films

Deposition Temperature = 100C

557-20-0

7732-18-5

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Resistivity, Sheet Resistance

van der Pauw sheet resistance

Ecopia HMS-3000

Carrier Concentration

van der Pauw sheet resistance

Ecopia HMS-3000

Mobility

van der Pauw sheet resistance

Ecopia HMS-3000

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Substrates

Silicon

Glass

Keywords

Notes

642



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