Jung-Dae Kwon Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jung-Dae Kwon returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
2Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
3Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
4Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
5Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
6A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
7Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
8Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition