
Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Ceramics International 43 (2017) 6580-6584
Date:
2017-02-20
Author Information
Name | Institution |
---|---|
Seung-Hwan Lee | Hanyang University |
Jung-Dae Kwon | Korea Institute of Materials Science |
Ji-Hoon Ahn | Korea Maritime and Ocean University |
Jin-Seong Park | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Substrates
SiO2 |
soda lime glass |
Notes
1620 |