Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Ceramics International 43 (2017) 6580-6584
Date:
2017-02-20

Author Information

Name Institution
Seung-Hwan LeeHanyang University
Jung-Dae KwonKorea Institute of Materials Science
Ji-Hoon AhnKorea Maritime and Ocean University
Jin-Seong ParkHanyang University

Films

Plasma Nb


Thermal Nb2O5

Hardware used: Unknown


CAS#: 10028-15-6

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy

Characteristic: Carrier Concentration
Analysis: Hall Measurements

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements

Substrates

SiO2
soda lime glass

Keywords

Notes

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