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Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Ceramics International 43 (2017) 6580-6584
Date:
2017-02-20
Author Information
| Name | Institution |
|---|---|
| Seung-Hwan Lee | Hanyang University |
| Jung-Dae Kwon | Korea Institute of Materials Science |
| Ji-Hoon Ahn | Korea Maritime and Ocean University |
| Jin-Seong Park | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Substrates
| SiO2 |
| soda lime glass |
Notes
| 1620 |