Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Niobium Pentafluoride, Niobium(V) fluoride, NbF5, CAS# 7783-68-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
2Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
3Alloyed 2D Metal-Semiconductor Atomic Layer Junctions