Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma

Type:
Journal
Info:
Ceramics International 44 (2018) 20890-20895
Date:
2018-08-10

Author Information

Name Institution
Ju-Hwan HanHanyang University
Jin-Myung ChoiHanyang University
Seong-Hyeon LeeHanyang University
Woojin JeonDankook University
Jin-Seong ParkHanyang University

Films

Plasma SiNx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: FTIR reflectance

Substrates

Silicon

Keywords

Air Exposure Transients

Notes

1647