Di(isopropylamino)Silane, (i-PrHN)2SiH2, DIPAS, CAS# 908831-34-5

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1EreztechDi(isopropylamino)Silane, (i-PrHN)2SiH2, DIPAS

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
2Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
3Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications


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