Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing

Type:
Journal
Info:
Applied Surface Science 252 (2006) 7878 - 7883
Date:
2005-09-25
DOI:
https://doi.org/10.1016/j.apsusc.2005.09.069

Author Information

Name Institution
Gwangpyo ChoiJAMIC
L. SatyanarayanaChosun University
Jin-Seong ParkChosun University

Films

Plasma SnO2

Hardware used: Unknown
DiButylTinDiAcetate, DBTDA, ((CH3CO2)2Sn[(CH2)3CH3]2)
CAS#: 1067-33-0
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-400C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: PSIA XE-200

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku D/Max-3C

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 250

Characteristic: Gas Sensing
Analysis: Custom
Diagnostic: HP 34401A

Substrates

SiO2

Notes

1301