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Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
Type:
Journal
Info:
Applied Surface Science 252 (2006) 7878 - 7883
Date:
2005-09-25
Author Information
| Name | Institution |
|---|---|
| Gwangpyo Choi | JAMIC |
| L. Satyanarayana | Chosun University |
| Jin-Seong Park | Chosun University |
Films
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Gas Sensing
Analysis: Custom
Substrates
| SiO2 |
Notes
| 1301 |