Publication Information

Title: Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing

Type: Journal

Info: Applied Surface Science 252 (2006) 7878 - 7883

Date: 2005-09-25

DOI: https://doi.org/10.1016/j.apsusc.2005.09.069

Author Information

Name

Institution

JAMIC

Chosun University

Chosun University

Films

Plasma SnO2 using Unknown

Deposition Temperature Range = 200-400C

1067-33-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

PSIA XE-200

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku D/Max-3C

Thickness

Ellipsometry

J.A. Woollam M-2000V

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 250

Gas Sensing

Custom

HP 34401A

Substrates

SiO2

Keywords

Notes

1301



Shortcuts



© 2014-2019 plasma-ald.com