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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
Type:
Journal
Info:
Applied Surface Science 252 (2006) 7878 - 7883
Date:
2005-09-25
Author Information
| Name | Institution |
|---|---|
| Gwangpyo Choi | JAMIC |
| L. Satyanarayana | Chosun University |
| Jin-Seong Park | Chosun University |
Films
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Gas Sensing
Analysis: Custom
Substrates
| SiO2 |
Keywords
Notes
| 1301 |