Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


DiButylTinDiAcetate, DBTDA, ((CH3CO2)2Sn[(CH2)3CH3]2), CAS# 1067-33-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
2Surface and sensing properties of PE-ALD SnO2 thin film
3Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
4Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
5Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
6Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing