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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
Type:
Journal
Info:
2010 Nanotechnology 21 245605
Date:
2010-05-25
Author Information
| Name | Institution |
|---|---|
| Won-Sik Kim | Seoul National University |
| Byoung-Sun Lee | Seoul National University |
| Dai-Hong Kim | Seoul National University |
| Hong-Chan Kim | Seoul National University |
| Woong-Ryeol Yu | Seoul National University |
| Seong-Hyeon Hong | Seoul National University |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Gas Sensing
Analysis: Custom
Substrates
| PAN, PolyAcryloNitrile |
Notes
| 76 |