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Publication Information

Title: Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 46, No. 4, April 2005, pp. L756-L759

Date: 2005-02-01

DOI: No DOI

Author Information

Name

Institution

Chonnam National University

Chonnam National University

Chosun University

Chosun University

Chosun University

Chosun University

Films

Plasma SnO2 using Custom

Deposition Temperature Range N/A

1067-33-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Substrates

Si(100)

Keywords

Notes

Films annealed.

122



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