Publication Information

Title: Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma

Type: Journal

Info: Journal of Electroceramics, v. 36, n. 1, p. 165--169 (2016)

Date: 2016-01-25

DOI: http://dx.doi.org/10.1007/s10832-016-0015-4

Author Information

Name

Institution

Pusan National University

Hanyang University

Pusan National University

Films

Plasma TaNx using Unknown

Deposition Temperature = 230C

629654-53-1

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

SEM, Scanning Electron Microscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Microstructure

XRD, X-Ray Diffraction

Unknown

Adhesion

Scotch Tape Test

Unknown

Diffusion Barrier Properties

Anneal

Unknown

Substrates

SiO2

Keywords

Notes

771



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