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Publication Information
Title:
Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 12 (3) H77-H79 (2009)
Date:
2008-12-08
Author Information
Name | Institution |
---|---|
Daekwon Joo | Korea Advanced Institute of Science and Technology |
Jin-Seong Park | Samsung Display Co. |
Sang-Won Kang | Korea Advanced Institute of Science and Technology |
Films
Plasma Ir
Plasma TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Substrates
Ir |
Keywords
Notes
1181 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |