About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery

Type:
Journal
Info:
Electrochimica Acta Volume 322, 2019, Pages 134766
Date:
2019-08-29

Author Information

Name Institution
Dip K. NandiYeungnam University
Seungmin YeoYonsei University
Mohd Zahid AnsariYeungnam University
Soumyadeep SinhaChonnam National University
Taehoon CheonYeungnam University
Jiseok KwonHanyang University
Hyungjun KimYonsei University
Jaeyeong HeoChonnam National University
Taeseup SongHanyang University
Soo-Hyun KimYeungnam University

Films

Plasma WS2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry

Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy

Characteristic: Battery Properties
Analysis: Charge/Discharge Cycling

Substrates

SiO2
Stainless Steel

Notes

1358