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Publication Information

Title: Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires

Type: Journal

Info: Journal of Luminescence 145 (2014) 307 - 311

Date: 2013-07-31

DOI: http://dx.doi.org/10.1016/j.jlumin.2013.07.076

Author Information

Name

Institution

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Samsung Advanced Institute of Technology

Samsung Advanced Institute of Technology

Samsung Advanced Institute of Technology

Yonsei University

Films

Plasma MgO using Quros Plus 150

Deposition Temperature Range = 200-400C

1284-72-6

7782-44-7

Thermal MgO using Custom

Deposition Temperature Range = 200-400C

1284-72-6

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Microstructure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Microstructure

TEM, Transmission Electron Microscope

Unknown

Images

TEM, Transmission Electron Microscope

Unknown

Microstructure

SEM, Scanning Electron Microscopy

Unknown

Photoluminescence

PL, PhotoLuminescence

Unknown

Substrates

Si(001)

SiO2

ZnO

Keywords

Passivation

Notes

600



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