Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires

Type:
Journal
Info:
Journal of Luminescence 145 (2014) 307 - 311
Date:
2013-07-31
DOI:
http://dx.doi.org/10.1016/j.jlumin.2013.07.076

Author Information

Name Institution
Jeong-Gyu SongYonsei University
Jusang ParkYonsei University
Jaehong YoonYonsei University
Hwangje WooYonsei University
Kyungyong KoYonsei University
Taeyoon LeeYonsei University
Sung-Hwan HwangYonsei University
Jae Min MyoungYonsei University
Keewon KimSamsung Advanced Institute of Technology
Youngman JangSamsung Advanced Institute of Technology
Kwangseok KimSamsung Advanced Institute of Technology
Hyungjun KimYonsei University

Films

Plasma MgO

Hardware used: Quros Plus 150
bis(cyclopentadienyl)Magnesium, MgCp2
CAS#: 1284-72-6
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-400C

Thermal MgO

Hardware used: Custom
bis(cyclopentadienyl)Magnesium, MgCp2
CAS#: 1284-72-6
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 200-400C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: -

Substrates

Si(001)
SiO2
ZnO

Notes

600