Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


bis(cyclopentadienyl)Magnesium, MgCp2, CAS# 1284-72-6

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸Bis(cyclopentadienyl) magnesium(II)
2Pegasus Chemicals🇬🇧Bis(cyclopentadienyl)magnesium
3DOCK/CHEMICALS🇩🇪Bis(cyclopentadienyl)magnesium
4Strem Chemicals, Inc.🇺🇸Bis(cyclopentadienyl)magnesium (99.9+%-Mg)
5Strem Chemicals, Inc.🇺🇸Bis(cyclopentadienyl)magnesium (99.99+%-Mg

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
2In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
3Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
4Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
5Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition