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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A141 (2016)
Date:
2015-12-04
Author Information
| Name | Institution |
|---|---|
| Yu-Chang Lin | National Cheng Kung University |
| Hsin-Ying Lee | National Cheng Kung University |
| Ching-Ting Lee | National Cheng Kung University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: -
Characteristic: Transmittance
Analysis: -
Characteristic: Optical Bandgap
Analysis: -
Characteristic: Dark Current
Analysis: -
Characteristic: Photocurrent
Analysis: -
Substrates
| Sapphire |
Keywords
| Photodetectors |
Notes
| 449 |