Title: Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
Type: Journal
Info: Journal of the Korean Physical Society, Vol. 56, No. 3, pp. 905--910
Date: 2010-02-12
DOI: https://inis.iaea.org/search/search.aspx?orig_q=RN:44036343
Name
Institution
Hanyang University
Hanyang University
Hanyang University
Hanyang University
Hanyang University
19962-11-9
Characteristic
Analysis
Diagnostic
Conformality, Step Coverage
SEM, Scanning Electron Microscopy
Unknown
Barrier Characteristics
Anneal
Unknown
Resistivity, Sheet Resistance
Four-point Probe
Unknown
Compositional Depth Profiling
AES, Auger Electron Spectroscopy
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
GIXRD, Grazing Incidence X-Ray Diffraction
Unknown
Morphology, Roughness, Topography
Unknown
Unknown
Si(100)
Interconnect
Diffusion Barrier
701
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