Name

Institution

Wooho Jeong

Hanyang University

Youngbin Ko

Hanyang University

Seokhwan Bang

Hanyang University

Seungjun Lee

Hanyang University

Hyeongtag Jeon

Hanyang University

Plasma HfN_x using Custom

Deposition Temperature Range = 100-400C

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

N₂, Nitrogen

7727-37-9

Characteristic

Analysis

Diagnostic

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

-

Barrier Characteristics

Anneal

-

Resistivity, Sheet Resistance

Four-point Probe

-

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

-

Morphology, Roughness, Topography

-

-

Si(100)

Interconnect

Diffusion Barrier

701