Publication Information

Title:
Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 56, No. 3, pp. 905--910
Date:
2010-02-12

Author Information

Name Institution
Wooho JeongHanyang University
Youngbin KoHanyang University
Seokhwan BangHanyang University
Seungjun LeeHanyang University
Hyeongtag JeonHanyang University

Films


Film/Plasma Properties

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Barrier Characteristics
Analysis: Anneal

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: -

Substrates

Si(100)

Keywords

Interconnect
Diffusion Barrier

Notes

701