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Search 1531 plasma ALD publications by:
Publication Information
Title:
Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 56, No. 3, pp. 905--910
Date:
2010-02-12
Author Information
Name | Institution |
---|---|
Wooho Jeong | Hanyang University |
Youngbin Ko | Hanyang University |
Seokhwan Bang | Hanyang University |
Seungjun Lee | Hanyang University |
Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Barrier Characteristics
Analysis: Anneal
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: -
Substrates
Si(100) |
Keywords
Interconnect |
Diffusion Barrier |
Notes
701 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |