Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 56, No. 3, pp. 905--910
Date:
2010-02-12
Author Information
| Name | Institution |
|---|---|
| Wooho Jeong | Hanyang University |
| Youngbin Ko | Hanyang University |
| Seokhwan Bang | Hanyang University |
| Seungjun Lee | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Barrier Characteristics
Analysis: Anneal
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: -
Substrates
| Si(100) |
Notes
| 701 |