About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte

Type:
Journal
Info:
International Journal of Hydrogen Energy 41 (2016) 9638 - 9643
Date:
2016-04-13

Author Information

Name Institution
Taehyun ParkSeoul National University
Gu Young ChoSeoul National University
Yoon Ho LeeSeoul National University
Waqas Hassan TanveerSeoul National University
Wonjong YuSeoul National University
Yeageun LeeSeoul National University
Yusung KimSeoul National University
Jihwan AnSeoul National University of Science and Technology
Suk Won ChaSeoul National University

Films


Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Pt

Notes

821