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CN1 Atomic Premium Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using CN1 Atomic Premium hardware returned 18 records.

NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
2Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
3Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
4Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
5Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
6Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
7Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
8Large-scale synthesis of uniform hexagonal boron nitride films by plasma-enhanced atomic layer deposition
9Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
10Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
11In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
12Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
13Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
14Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
15Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
16In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
1746-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
18Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells