About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte

Type:
Journal
Info:
Beilstein J. Nanotechnol. 2015, 6, 1805--1810
Date:
2015-08-09
DOI:
http://dx.doi.org/10.3762/bjnano.6.184

Author Information

Name Institution
Sanghoon JiSeoul National University
Waqas Hassan TanveerSeoul National University
Wonjong YuSeoul National University
Sungmin KangKorea Advanced Institute of Science and Technology
Gu Young ChoSeoul National University
Sung Han KimSamsung Electronics Co.
Jihwan AnSeoul National University of Science and Technology
Suk Won ChaSeoul National University

Films

Plasma YSZ

Hardware used: CN1 Atomic Premium
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
Tris(methylcyclopentadienyl)yttrium(III), (MeCp)3Y
CAS#: 329735-72-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 3D FEG

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: JEOL 2100F

Substrates

AAO, Anodic Aluminum Oxide

Notes

395