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Large-scale synthesis of uniform hexagonal boron nitride films by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Scientific Reports 7, Article number: 40091 (2016)
Date:
2016-12-01
DOI:
http://dx.doi.org/10.1038/srep40091

Author Information

Name Institution
Hamin ParkKorea Advanced Institute of Science and Technology
Tae Keun KimKorea Advanced Institute of Science and Technology
Sung Woo ChoDNF Co. Ltd.
Hong Seok JangDNF Co. Ltd.
Sang-Ick LeeDNF Co. Ltd.
Sung-Yool ChoiKorea Advanced Institute of Science and Technology

Films

Plasma BN

Hardware used: CN1 Atomic Premium
3EMAB, TEMAB, (EtMeN)3B, (C2H5CH3)N)3B, Tris(ethylmethylamido)borane
CAS#: 0-0-0
N2, Nitrogen
CAS#: 7727-37-9
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature Range = 250-350C

Film/Plasma Properties

Substrates

Notes

873