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Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A151 (2016)
Date:
2015-12-07
DOI:
http://dx.doi.org/10.1116/1.4938105

Author Information

Name Institution
Gu Young ChoSeoul National University
Seungtak NohSeoul National University
Yoon Ho LeeSeoul National University
Sanghoon JiSeoul National University
Soon Wook HongHanyang University
Bongjun KooHanyang University
Jihwan AnSeoul National University of Science and Technology
Young-Beom KimHanyang University
Suk Won ChaSeoul National University

Films

Plasma ZrO2

Hardware used: CN1 Atomic Premium
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-250C

Thermal ZrO2

Hardware used: CN1 Atomic Premium
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-250C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Park Systems, XE-150

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 3D FEG

Substrates

AAO, Anodic Aluminum Oxide
Silicon

Notes

447