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Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells

Type:
Journal
Info:
Energy 173 (2019) 436-442
Date:
2019-01-22
DOI:
https://doi.org/10.1016/j.energy.2019.01.124

Author Information

Name Institution
Gu Young ChoSeoul National University
Yoon Ho LeeSeoul National University
Wonjong YuSeoul National University
Jihwan AnSeoul National University of Science and Technology
Suk Won ChaSeoul National University

Films

Plasma YSZ

Hardware used: CN1 Atomic Premium
Tris(methylcyclopentadienyl)yttrium(III), (MeCp)3Y
CAS#: 329735-72-0
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Diagnostic: Solatron Analytical 1287/1260

Characteristic: Open Circuit Voltage
Analysis: Custom
Diagnostic: Solatron Analytical 1287/1260

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Supra 55

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2100F

Substrates

Pt

Notes

1656