Publication Information

Title: Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes

Type: Journal

Info: Scientific Reports 7, Article number: 40061 (2016)

Date: 2016-11-30

DOI: http://dx.doi.org/10.1038/srep40061

Author Information

Name

Institution

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Films

Plasma ZrO2 using Kemicro PEALD-150

Deposition Temperature = 80C

19756-04-8

7782-44-7

Deposition Temperature = 80C

19756-04-8

107-21-1

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

QCM, Quartz Crystal Microbalance

-

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

-

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Water Vapor Transmission Rate (WVTR)

Calcium Test

-

Substrates

PET, Polyethylene Terephthalate

Zircone

Silicon

Keywords

Encapsulation

Notes

876



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