Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 33, 01A145 (2015)
Date:
2014-12-03
DOI:
http://dx.doi.org/10.1116/1.4904206

Author Information

Name Institution
Wonjong YuSeoul National University
Sanghoon JiSeoul National University
Gu Young ChoSeoul National University
Seungtak NohSeoul National University
Waqas Hassan TanveerSeoul National University
Jihwan AnSeoul National University of Science and Technology
Suk Won ChaSeoul National University

Films

Plasma YSZ

Hardware used: CN1 Atomic Premium
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
Where to buy precursor
Tris(methylcyclopentadienyl)yttrium(III), (MeCp)3Y
CAS#: 329735-72-0
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Axis

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 3D FEG

Characteristic: Electrochemical Performance
Analysis: Custom
Diagnostic: Solatron Analytical 1287/1260

Substrates

YSZ

Notes

621