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Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Texture of atomic layer deposited ruthenium
Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 33, 01A145 (2015)
Date:
2014-12-03
Author Information
| Name | Institution |
|---|---|
| Wonjong Yu | Seoul National University |
| Sanghoon Ji | Seoul National University |
| Gu Young Cho | Seoul National University |
| Seungtak Noh | Seoul National University |
| Waqas Hassan Tanveer | Seoul National University |
| Jihwan An | Seoul National University of Science and Technology |
| Suk Won Cha | Seoul National University |
Films
Plasma YSZ
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Electrochemical Performance
Analysis: Custom
Substrates
| YSZ |
Keywords
| Fuel Cell |
Notes
| 621 |