Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate

Publication Information

Title: Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate

Type: Journal

Info: Journal of Vacuum Science & Technology A 33, 01A145 (2015)

Date: 2014-12-03

DOI: http://dx.doi.org/10.1116/1.4904206

Author Information

Name

Institution

Wonjong Yu

Seoul National University

Sanghoon Ji

Seoul National University

Gu Young Cho

Seoul National University

Seungtak Noh

Seoul National University

Waqas Hassan Tanveer

Seoul National University

Jihwan An

Seoul National University of Science and Technology

Suk Won Cha

Seoul National University

Films

Plasma YSZ using Atomic Premium CN1

Deposition Temperature = 250C

TDMAZr, (Me₂N)₄Zr, [(CH₃)₂N]₄Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide

19756-04-8

Where to buy precursor

Tris(methylcyclopentadienyl)yttrium(III), (MeCp)₃Y

329735-72-0

Where to buy precursor

O₂, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Axis

Microstructure

SEM, Scanning Electron Microscopy

FEI Quanta 3D FEG

Electrochemical Performance

Custom

Solatron Analytical 1287/1260

Substrates

YSZ

Keywords

Fuel Cell

Notes

621

Mark Sowa

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Precursors

Deposition Hardware

Film and Plasma Characteristics

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