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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
Type:
Journal
Info:
Beilstein J. Nanotechnol. 2015, 6, 1805--1810
Date:
2015-08-09
Author Information
| Name | Institution |
|---|---|
| Sanghoon Ji | Seoul National University |
| Waqas Hassan Tanveer | Seoul National University |
| Wonjong Yu | Seoul National University |
| Sungmin Kang | Korea Advanced Institute of Science and Technology |
| Gu Young Cho | Seoul National University |
| Sung Han Kim | Samsung Electronics Co. |
| Jihwan An | Seoul National University of Science and Technology |
| Suk Won Cha | Seoul National University |
Films
Plasma YSZ
Film/Plasma Properties
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| AAO, Anodic Aluminum Oxide |
Keywords
Notes
| 395 |