Publication Information

Title:
The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
J. Phys. Chem. C, 2017, 121 (8), pp 4714-4719
Date:
2017-02-09

Author Information

Name Institution
Zheng ChenJilin University
Haoran WangJilin University
Pengpeng XiongJilin University
Ping ChenJilin University
Huiying LiJilin University
Yunfei LiuJilin University
Yu DuanJilin University

Films


Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance

Substrates

Silicon
KBr

Keywords

Notes

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