Publication Information

Title: The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: J. Phys. Chem. C, 2017, 121 (8), pp 4714-4719

Date: 2017-02-09

DOI: http://dx.doi.org/10.1021/acs.jpcc.7b00211

Author Information

Name

Institution

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Jilin University

Films

Plasma ZrO2 using Kemicro PEALD-150

Deposition Temperature Range = 80-250C

19756-04-8

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

-

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Vertex 70

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Thickness

QCM, Quartz Crystal Microbalance

-

Substrates

Silicon

KBr

Keywords

Notes

1221



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