The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
J. Phys. Chem. C, 2017, 121 (8), pp 4714-4719
Date:
2017-02-09
Author Information
| Name | Institution |
|---|---|
| Zheng Chen | Jilin University |
| Haoran Wang | Jilin University |
| Pengpeng Xiong | Jilin University |
| Ping Chen | Jilin University |
| Huiying Li | Jilin University |
| Yunfei Liu | Jilin University |
| Yu Duan | Jilin University |
Films
Plasma ZrO2
Film/Plasma Properties
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Substrates
| Silicon |
| KBr |
Notes
| 1221 |