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Publication Information

Title: Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition

Type: Journal

Info: Current Applied Physics 14 (2014) 552-557

Date: 2013-11-30

DOI: http://dx.doi.org/10.1016/j.cap.2013.11.053

Author Information

Name

Institution

Sanghun Lee

Hanyang University

Films

Plasma Al2O3 using Custom

Deposition Temperature = 100C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Plasma ZrO2 using Custom

Deposition Temperature = 100C

Tetrakis[(EthylMethyl)Amido]Zirconium, [(EtMe)N]4Zr, TEMAZr

175923-04-3

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

220


Mark Sowa

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