Publication Information

Title: Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition

Type: Journal

Info: Current Applied Physics 14 (2014) 552-557

Date: 2013-11-30

DOI: http://dx.doi.org/10.1016/j.cap.2013.11.053

Author Information

Name

Institution

Sanghun Lee

Hanyang University

Films

Plasma Al2O3 using Custom

Deposition Temperature = 100C

TMA, AlMe3, Trimethyl Aluminum

75-24-1

Where to buy precursor

O2, Oxygen

7782-44-7

Plasma ZrO2 using Custom

Deposition Temperature = 100C

TEMAZr, (EtMeN)4Zr, [(C2H5)(CH3)N]4Zr, Tetrakis(EthylMethylAmido) Zirconium, Zirconium Ethylmethylamide

175923-04-3

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

220


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2019 plasma-ald.com