Publication Information

Title:
PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
Type:
Journal
Info:
Semiconductors, 2017, Vol. 51, No. 1, pp 131-133.
Date:
2016-06-08

Author Information

Name Institution
Anil G. KhairnarNorth Maharashtra University
V.S. PatilNorth Maharashtra University
K.S. AgrawalNorth Maharashtra University
R. S. SalunkeNorth Maharashtra University
A.M. MahajanNorth Maharashtra University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Interfacial Layer
Analysis: -

Substrates

6H-SiC

Keywords

Low Power Plasma

Notes

998