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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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A.M. Mahajan Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by A.M. Mahajan returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
2Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
3Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
4High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
5XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
6PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor