Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
Type:
Journal
Info:
Semiconductors, April 2014, Volume 48, Issue 4, pp 497-500
Date:
2014-04-17
Author Information
| Name | Institution |
|---|---|
| A.M. Mahajan | North Maharashtra University |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
Notes
| 210 |