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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
Type:
Journal
Info:
2019 Semicond. Sci. Technol. 34, 034004
Date:
2018-11-09
Author Information
| Name | Institution |
|---|---|
| V.S. Patil | North Maharashtra University |
| K.S. Agrawal | North Maharashtra University |
| Viral Barhate | North Maharashtra University |
| V.S. Patil | North Maharashtra University |
| A.M. Mahajan | North Maharashtra University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(100) |
Keywords
Notes
| 1482 |