XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films

Type:
Journal
Info:
2019 Semicond. Sci. Technol. 34, 034004
Date:
2018-11-09

Author Information

Name Institution
V.S. PatilNorth Maharashtra University
K.S. AgrawalNorth Maharashtra University
Viral BarhateNorth Maharashtra University
V.S. PatilNorth Maharashtra University
A.M. MahajanNorth Maharashtra University

Films

Plasma La2O3



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)

Notes

1482