Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


LaCp3, Tris(cyclopentadienyl) lanthanum, CAS# 1272-23-7

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸Tris(cyclopentadienyl)lanthanum(III)
2Pegasus Chemicals🇬🇧Tris(cyclopentadienyl)lanthanum

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films