Publication Information

Title:
Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
Type:
Journal
Info:
Japanese Journal of Applied Physics 55, 016502 (2016)
Date:
2015-10-23

Author Information

Name Institution
Kyeong-Keun ChoiPohang University of Science and Technology (POSTECH)
Chan Gyung ParkPohang University of Science and Technology (POSTECH)
Deok-Kee KimSejong University

Films

Other ZrO2


Film/Plasma Properties

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Ta
TaN

Keywords

Notes

466