Publication Information

Title: Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications

Type: Journal

Info: Japanese Journal of Applied Physics 55, 016502 (2016)

Date: 2015-10-23

DOI: http://dx.doi.org/10.7567/JJAP.55.016502

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Sejong University

Films

Other ZrO2 using Unknown

Deposition Temperature Range N/A

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Capacitance

C-V, Capacitance-Voltage Measurements

Unknown

Substrates

Ta

TaN

Keywords

Notes

466



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