Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
Type:
Journal
Info:
Coatings 2021, 11, 362
Date:
2021-03-17
Author Information
| Name | Institution |
|---|---|
| Jiwon Oh | Hongik University |
| Giwon Seo | Hongik University |
| Jae-Hwan Kim | Hongik University |
| Seung-Muk Bae | Kunsan National University |
| Jeong-Woo Park | Hansol Chemical |
| Jin-Ha Hwang | Hongik University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Flat Band Voltage
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Silicon |
| YSZ |
| Ni |
Notes
| 1733 |