TEOS, Si(OC2H5)4, TetraEthyl OrthoSilicate, CAS# 78-10-4

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1EreztechTetraEthyl OrthoSilicate, Si(OC2H5)4, TEOS

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
2Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
3Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
4Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
5Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
6Radical Enhanced Atomic Layer Deposition of Metals and Oxides
7Optical and Electrical Properties of TixSi1-xOy Films


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