|2||Strem Chemicals, Inc.||Tetraethoxysilane, min. 98% TEOS|
|3||Ereztech||TetraEthyl OrthoSilicate, Si(OC2H5)4, TEOS|
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Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition|
|2||Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition|
|3||Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition|
|4||Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition|
|5||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|6||Optical and Electrical Properties of TixSi1-xOy Films|
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