TEOS, Si(OC2H5)4, TetraEthyl OrthoSilicate, CAS# 78-10-4

Where to buy

NumberVendorLink
1EntegrisTEOS
2Strem Chemicals, Inc.Tetraethoxysilane, min. 98% TEOS
3EreztechTetraEthyl OrthoSilicate, Si(OC2H5)4, TEOS

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
2Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
3Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
4Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
5Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
6Radical Enhanced Atomic Layer Deposition of Metals and Oxides
7Optical and Electrical Properties of TixSi1-xOy Films


Shortcuts



© 2014-2019 plasma-ald.com