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TetraEthyl OrthoSilicate, Si(OC2H5)4, TEOS, CAS# 78-10-4

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NumberVendorLink
1Strem Chemicals, Inc.Tetraethoxysilane, min. 98% TEOS

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
2Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
3Radical Enhanced Atomic Layer Deposition of Metals and Oxides
4Optical and Electrical Properties of TixSi1-xOy Films

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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