Publication Information

Title:
Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
J. Am. Chem. Soc. 2006, 128, 34 11018-11019
Date:
2006-08-09

Author Information

Name Institution
Ying-Bing JiangUniversity of New Mexico
Nanguo LiuUniversity of New Mexico
Henry GerungUniversity of New Mexico
Joseph L. CecchiUniversity of New Mexico
C. Jeffrey BrinkerUniversity of New Mexico

Films

Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Diffusion Barrier Properties
Analysis: TEM, Transmission Electron Microscope

Substrates

Mesoporous Silica

Keywords

Area Selective
Pore Sealing
Diffusion Barrier

Notes

1351