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Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
J. Am. Chem. Soc. 2006, 128, 34 11018-11019
Date:
2006-08-09
Author Information
| Name | Institution |
|---|---|
| Ying-Bing Jiang | University of New Mexico |
| Nanguo Liu | University of New Mexico |
| Henry Gerung | University of New Mexico |
| Joseph L. Cecchi | University of New Mexico |
| C. Jeffrey Brinker | University of New Mexico |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Diffusion Barrier Properties
Analysis: TEM, Transmission Electron Microscope
Substrates
| Mesoporous Silica |
Notes
| 1351 |